File:Al photoresist pattern developed via Nomarski DIC.jpg

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	22:10, 27 September 2009		2,124 × 1,620 (536 KB)	Richstraka~commonswiki	{{Information \|Description=The subject of this image is a silicon integrated circuit wafer in the region between two circuit die. The five pink and blue iregularly-shaped rectangles in the image are areas of photoresist that should have been fully etched

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Orientation	Normal
Horizontal resolution	600 dpi
Vertical resolution	600 dpi
Software used	Adobe Photoshop CS4 Macintosh
File change date and time	18:01, 27 September 2009
Color space	Uncalibrated