File:Semiconductor photomask.jpg

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	Date/Time	Thumbnail	Dimensions	User	Comment
current	13:45, 30 July 2011		2,000 × 2,000 (2.72 MB)	Peellden	{{Information \|Description ={{en\|1=A photomask}} \|Source ={{own}} \|Author =Peellden \|Date = \|Permission = \|other_versions = }} Category:Microlithography

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Image title	SONY DSC
Camera manufacturer	SONY
Camera model	DSLR-A580
Exposure time	1/200 sec (0.005)
F Number	f/4
ISO speed rating	100
Date and time of data generation	13:13, 30 July 2011
Lens focal length	40 mm
Orientation	Normal
Horizontal resolution	350 dpi
Vertical resolution	350 dpi
Software used	Adobe Photoshop CS2 Windows
File change date and time	21:29, 30 July 2011
Y and C positioning	Co-sited
Exposure Program	Aperture priority
Exif version	2.3
Date and time of digitizing	13:13, 30 July 2011
Image compression mode	1
APEX brightness	6.5
APEX exposure bias	0
Maximum land aperture	3.61 APEX (f/3.49)
Metering mode	Pattern
Light source	Daylight
Flash	Flash did not fire, compulsory flash suppression
Color space	sRGB