Doped

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Doped refers to the process of adding impurities to a semiconductor to change its electrical properties. This process is crucial in the manufacturing of electronic components such as diodes, transistors, and integrated circuits.

Types of Doping[edit | edit source]

There are two main types of doping:

  • N-type doping: This involves adding elements that have more valence electrons than the semiconductor. For example, adding phosphorus to silicon introduces extra electrons, making the material more conductive.
  • P-type doping: This involves adding elements with fewer valence electrons. For instance, adding boron to silicon creates "holes" or positive charge carriers, enhancing the material's conductivity.

Applications[edit | edit source]

Doping is essential in the creation of various semiconductor devices:

  • Diodes: These are created by joining P-type and N-type materials, forming a p-n junction.
  • Transistors: These devices use doped regions to control the flow of current and are fundamental in amplifiers and switches.
  • Integrated circuits: These are complex assemblies of multiple semiconductor devices on a single chip, used in virtually all modern electronic equipment.

Doping Techniques[edit | edit source]

Several techniques are used to introduce dopants into semiconductors:

  • Diffusion: This involves placing the semiconductor in a high-temperature environment with the dopant material, allowing the dopant atoms to diffuse into the semiconductor.
  • Ion implantation: This technique uses a beam of dopant ions that are accelerated and implanted into the semiconductor material.
  • Epitaxy: This method involves growing a layer of doped semiconductor on top of a substrate.

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Contributors: Prab R. Tumpati, MD