Triethylgallium

Triethylgallium_200.svg

Triethylgallium (TEGa) is a chemical compound with the formula Ga(C₂H₅)₃. It is a colorless, pyrophoric liquid that is used primarily in the semiconductor industry for the deposition of gallium-containing films.

Chemical Properties

Triethylgallium is an organometallic compound consisting of a gallium atom bonded to three ethyl groups. It is highly reactive and can ignite spontaneously in air. The compound is typically handled under an inert atmosphere, such as nitrogen or argon, to prevent oxidation and combustion.

Synthesis

Triethylgallium can be synthesized through the reaction of gallium trichloride (GaCl₃) with an organolithium reagent, such as ethyl lithium (C₂H₅Li). The reaction proceeds as follows:

GaCl₃ + 3 C₂H₅Li → Ga(C₂H₅)₃ + 3 LiCl

Applications

Semiconductor Industry

Triethylgallium is widely used in the metalorganic chemical vapor deposition (MOCVD) process to produce gallium-containing semiconductor materials, such as gallium arsenide (GaAs) and gallium nitride (GaN). These materials are essential components in the manufacture of light-emitting diodes (LEDs), laser diodes, and high-electron-mobility transistors (HEMTs).

Research

In addition to its industrial applications, triethylgallium is also used in academic and industrial research to study the properties of gallium-containing compounds and to develop new materials with advanced electronic and optical properties.

Safety

Triethylgallium is highly pyrophoric and can ignite spontaneously upon exposure to air. It is also toxic and can cause severe burns upon contact with skin. Proper safety precautions, including the use of glove boxes and fume hoods, are essential when handling this compound.

See Also

• Gallium
• Organometallic chemistry
• Metalorganic chemical vapor deposition
• Gallium arsenide
• Gallium nitride